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To: Andrew Vance who wrote (1264)8/9/2001 3:17:13 PM
From: Artslaw  Read Replies (2) | Respond to of 1305
 
Sorry Andrew--I missed the argument where this patent "has to be dealt with by every manufacturer or step and scans in the industry". This patent covers the use of multiple reticles for the same layer. Is this common? I have never heard of it and would rather not have to stitch my design together in the lateral directions (x, y). Worrying about registration (alignment) at all the boundaries, rather than just the vertical direction (z), would be a hassle. I suppose one would just thicken all the lines that cross those edges in the design, but I say just make the mask smaller. Seems like a yield killer.

Steve



To: Andrew Vance who wrote (1264)8/14/2001 1:50:52 AM
From: TI2, TechInvestorToo  Respond to of 1305
 
Andrew, The original post on this patent said refractive system. Is that in the patent? That would not be an issue for original step n scan of Perkin elmer/svgl now ASML. Nikon and asml refractive scanners came later. Seems like this was a GCA patent from the people (Bruning , Dave B).
TI2


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