To: Jerome who wrote (108 ) 10/29/2001 8:12:46 AM From: Proud_Infidel Respond to of 25522 AKT Introduces 15K CVD System for Manufacturing Latest Fifth Generation TFT-LCD Panel Displays AKT 15K PECVD System Enables Large-Size Monitor and TV Liquid Crystal Displays SANTA CLARA, Calif.--(BUSINESS WIRE)--Oct. 29, 2001--AKT, an Applied Materials company and the world's leading supplier of plasma-enhanced chemical vapor deposition (PECVD) systems to the flat panel display (FPD) industry, announces the AKT 15K PECVD system. The 15K system deposits silicon-based films on the industry's latest Generation 5 TFT-LCD (thin film transistor liquid crystal display) substrates approximately 1.1m x 1.2m in size. AKT has received multiple orders for the 15K system; shipments are expected to begin in the third calendar quarter of 2002. ``With TFT-LCD computer monitors and TVs now entering the consumer mainstream, display manufacturers are aggressively adopting larger substrate sizes that can more economically produce multiple large displays per substrate,'' noted Dr. Kam Law, president of AKT. ``Display manufacturers can use the AKT 15K PECVD system to make approximately 2.5 times more 15-inch flat panel displays and over 1.5 times more 17 to 21-inch displays than Generation 4 systems, which uses substrates approximately 700mm x 900mm in size.'' The AKT 15K PECVD system features up to five process chambers, contributing to a high throughput of greater than 50 substrates per hour for maximum productivity and efficiency. Based on the field-proven process chamber design and substrate heating configuration of AKT's 10K system, the new 15K system provides excellent deposition uniformity and superior temperature uniformity across the large substrate area. The system offers a standard software/hardware interface for connectivity to multiple factory interfaces, including cassette load stations, single substrate delivery technology, and other types of customer-supplied factory interfaces. The 15K system offers processes for multiple applications, including both doped and undoped amorphous silicon (a-Si), silicon oxide, silicon oxynitride (SiON), silicon nitride, and in-situ multi-layer depositions. The system is equipped with Remote Plasma Source Clean technology for chamber cleaning, enabling highly repeatable deposition for over one month of full production without wet cleaning. Applied Materials (Nasdaq:AMAT - news), the largest supplier of products and services to the global semiconductor industry, is one of the world's leading information infrastructure providers. Applied Materials enables Information for Everyone(TM) by helping semiconductor manufacturers produce more powerful, portable and affordable chips. Applied Materials' Web site is appliedmaterials.com .