SI
SI
discoversearch

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor.  We ask that you disable ad blocking while on Silicon Investor in the best interests of our community.  If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.
Technology Stocks : Intel Corporation (INTC) -- Ignore unavailable to you. Want to Upgrade?


To: Noel who wrote (146679)11/2/2001 3:53:28 PM
From: Elmer  Read Replies (1) | Respond to of 186894
 
Most designs are metal limited not transistor limited

I'm not so sure this is true anymore with 6 & 7 metal layers. Plus large SRAM caches don't have the routing issues random logic would.

Also, you will see a 25% cost gain from the transition to 0.13 micron as the P4 die size shrinks. But this comes from shrinking the design itself. Not due to a larger wafer.

Don't you mean cost reduction?

Going from .18u aluminum to .13u copper will not be a shrink but a compaction, meaning a complete relayout.

EP



To: Noel who wrote (146679)11/2/2001 9:42:39 PM
From: maui_dude  Respond to of 186894
 
Noel,
Re : "What makes you think removing 5-10% of transistors will reduce the die size? Most designs are metal limited not transistor limited"

I made a rough assumption that 5-10% extra transistor resulted in proportionally percentage increase in the interconnects.

Re : "So moving from 0.18 micron Willamette to 0.13 micron Northwood will give a great cost benefit"

Then why is the cost benefit only 5% by end of 2002 ? Isn't most of .18 to .13 migration complete by then ?

Re : "I don't think there has ever been a 25% cost gain just from process transition."

For the same yield and die size(and assume 50% area increase due to the cache and new logic)? why should it not give you 25% cost gain from just the process shrink ?

Maui.