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To: robert b furman who wrote (306)11/6/2001 9:11:12 AM
From: Proud_Infidel  Respond to of 25522
 
Japanese consortium plans $230 million project

By Jack Robertson
EBN
(11/06/01 02:12 a.m. EST)

Selete (Semiconductor Leading Edge Technology) Inc., the consortium of 11 Japanese chip companies, Tuesday in Japan announced plans to build three new labs in a $230 million program to develop 0.07-micron to 0.10-micron processes for next-generation semiconductors.

Selete, contacted in Totsuka, Japan, said the three new labs will each work on different aspects of new lithography and etching processes.

Selete is participating in a five-year government/industry program called Asuka to compete against U.S. companies which are also working on the advanced processing. Intel Corp. two weeks ago said it would start early transitioning to 0.09-micron processing in the third quarter of 2003.

The three new Selete labs include a facility at an NEC research center in Tsukuba and also part of new lab by the National Institute of Advanced Industrial Science and Technology in the same city. A third lab would be part of a research center operated by Toppan Printing Co. in Sugito.