Intel "scrambling" for 193-nm lith scanners
Looks like those phase shifts will continue.
As Scooby would say, "rut row".
Intel is scrambling for 193-nm tools after ASML's kills SVG's 193-nm tools
By Mark LaPedus
Semiconductor Business News
(11/27/01 16:11 p.m. EST)
siliconstrategies.com
SANTA CLARA, Calif. -- Officials from Intel Corp. here today insisted that ASM Lithography's move to drop Silicon Valley Group Inc.'s 193-nm scanner line would not impact Intel's own chip-manufacturing or product efforts.
But the move confirms previous reports in SBN that a multi-million-dollar, 193-nm scanner order is up for grabs at Intel. At present, Intel is reportedly "scrambling" to secure 193-nm tools for its next-generation process technologies, and is evaluating competitive scanners from ASML, Canon Inc. and Nikon Corp., according to sources.
ASML and Nikon reportedly have the inside track for the 193-nm scanner business at the Santa Clara-based chip giant, according to sources. Intel declined to comment, however.
In any case, it's been a confusing turn of events at ASML--and Intel. As reported in SBN, plagued by chronic delays and a change of heart at Intel, ASML today announced that it would discontinue SVG's Micrascan V 193-nm lithography system. ASML also said it will converge all 193-nm wavelength tool offerings onto a single platform, based on the company's own dual-stage Twinscan system (see today's story ).
The decision kills a key product platform acquired by ASML earlier this year when it completed its purchase of Silicon Valley Group Inc. for $1.6 billion in stock.
Intel is also a central figure in these turn of events. The company--the sole customer for SVG's Micrascan V tool--was originally banking on these ill-fated 193-nm scanners for its future chip-manufacturing efforts.
For years, Intel has used two primary lithography-tool vendors--Nikon and SVG, according to analysts. Intel has a large installed base of 248-nm scanners from both Nikon and SVG, according to analysts.
Then, in late 1999, SVG received a $100 million order for its Micrascan 193 line of 193-nm tools from a "leading microprocessor manufacturer," of which sources said was Intel (see Dec. 15, 1999 story ).
At that time, Intel reportedly hoped to use SVG's 193-nm tools for use in processing the critical layers for its 0.13-micron devices, according to Intel executives. The Santa Clara-based chip giant was also expected to use 248-nm tools from both SVG and Nikon for the non-critical layers for these chips, they said.
But since then, SVG had been forced to push back delivery of the Micrascan 193 systems to Intel on several occasions, due to product delays. Originally, SVG was scheduled to deliver the Micrascan 193 late last year, but it was never able to develop or ship the product.
The delays forced Intel to re-think its lithography strategy. Instead of using SVG's 193-nm tools for its 0.13-micron chips, Intel was successfully able to extend its current 248-nm scanners from SVG and Nikon to process wafers at the 130-nm (0.13-micron) node.
But Intel has sent mixed messages about its ability to extend the 248-nm tools. At times, officials from Intel claimed that the company is using a technology called "phase-shift masks" to extend the 248-nm tools into the 130-nm node--a process that increases the overall costs of the photomasks--and chips.
Then, at other times, Intel insisted it is not using phase-shift mask techniques, claiming it was deploying other "tricks" with the photomask that had no impact on chip costs.
In any case, officials from Intel repeatedly said that the 193-nm scanner delays would have no impact on the company's 0.13-micron devices in terms of its production ramp. "Our 0.13-micron process is healthy," said a spokesman from Intel today.
ASML's decision to kill SVG's 193-nm tool "will not impact our roadmap," according to a spokesman from Intel. "We have multiple [chip-equipment] suppliers for a number of nodes," the spokesman said.
Intel insists that it's 0.13-micron ramp is moving full speed ahead. Gearing up its 0.13-micron process for its new Pentium 4 microprocessors and other chip lines, Intel last month announced plans to more than double the production of thistechnology over the next 18 months.
The move will expand Intel's 0.13-micron chip production to a staggering total of six wafer fabs by 2003 or sooner. At present, Intel is making and shipping 0.13-micron chips in two fabs--with four more plants waiting in the wings (see Oct. 17 story ).
Now, Intel is developing its 0.09-micron technology. Craig Barrett, president and chief executive of Intel, last month said the company is expected to roll out the first 0.09-micron chips in early-2003 (see Oct. 30 story ).
The company is expected to use 193-nm scanners to process the critical layers of the 0.09-micron devices, but analysts believe that Intel and other chip makers face some major hurdles with these advanced tools as well.
The lack of critical 193-nm, lithography-lens materials, coupled by immature photoresists and expensive mask sets, has hampered the adoption of 193-nm tools in today's production fabs, according to analysts.
While various vendors announced their 193-nm tools in the late-1990s, a total of only about 20 tools have been shipped in the market thus far, mostly for R&D purposes, according to analysts.
In recent months, however, ASML, Canon, and Nikon have separately announced next-generation 193-nm tools, claiming they are suitable for production-worthy fabs, it was noted. |
