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Technology Stocks : General Lithography -- Ignore unavailable to you. Want to Upgrade?

To: Cary Salsberg who wrote (1287)	11/29/2001 3:49:19 PM
From: Ian@SI	Respond to of 1305

Cary, This story seems to shed some light on the ASML decision to scrap the SVGL technology. FWIW, Ian siliconstrategies.com ASML dropped SVG's 193-nm tool due to problems with the lens technology, sources say Semiconductor Business News (11/28/01 15:57 p.m. EST) SANTA CLARA, Calif. -- ASM Lithography dropped Silicon Valley Group Inc.'s 193-nm scanner line, reportedly due in part to problems with the lens technology in the system, according to sources. ...

To: Cary Salsberg who wrote (1287)	11/29/2001 10:28:46 PM
From: SemiBull	Respond to of 1305

Optical lithography could push out EUV and EPL until 2010, says ITRS roadmap siliconstrategies.com

To: Cary Salsberg who wrote (1287)	12/15/2001 3:47:52 PM
From: Andrew Vance	Read Replies (2) \| Respond to of 1305

No one really want to hear this, but 157nm can be done with the GCA (XLS) platform that has been re-incarnated into an UTEK life form. We are not talking about the traditional UTEK product line, but rather the assets of ISI when they took them over. Also, it appears ASML is now ready with theirs. Of ocurse, CYMI has a 157nm laser ready to go, but your question really drives a good point home. Work must begin to find the most viable lens providers for 157nm and below. Hopefully we can identify them over the next few weeks. AV