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To: SemiBull who wrote (2716)1/22/2002 7:09:21 PM
From: SemiBull  Respond to of 2754
 
FSI to apply CryoKinetic cleaning technology to display applications

SAN JOSE --The U.S. Display Consortium today announced a contract award to FSI International Inc. of Chaska, Minn., to develop an enhanced cleaning system for production of flat-panel displays.

The development program will focus on cleaning systems for display applications using FSI's CryoKinetic technology. This cleaning technology uses high-velocity cryogenic aerosols to dislodge particulate contamination from silicon wafers. The CryoKinetic technology has been used by FSI to address semiconductor fab applications.

The display consortium and FSI will share in the program's costs, under the contract.

"This project will help us determine any special process conditions or tool design modifications that may be necessary to adapt existing cleaning technology to meet the specific needs of display technology," said Bob Pinnel, chief technology officer of the U.S. Display Consortium.