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Politics : Formerly About Applied Materials -- Ignore unavailable to you. Want to Upgrade?

To: StanX Long who wrote (58521)	1/8/2002 3:58:15 AM
From: StanX Long	Read Replies (1) \| Respond to of 70976

Veeco, Photronics partner in R&D for advanced photomask tools, processes Semiconductor Business News (01/07/02 21:23 p.m. EST) siliconstrategies.com WOODBURY, N.Y.--Veeco Instruments Inc. and Photronics Inc. today announced a strategic partnership to accelerate development of advanced manufacturing technologies for enhanced photolithography reticles and next-generation photomasks. In the initial phase of the partnership Photronics will purchase an ion bean deposition (IBD) low-defect density (LDD) system from Veeco for deposition of critical films. Veeco said its Nexus system has the ability to deposit thin films at extremely low particulate levels for production of photomasks utilizing chemically amplified resist and other advanced resist platforms. The two companies said they have also agreed to share technology roadmaps. Veeco on Long Island, N.Y, said it plans to develop additional process equipment and metrology solutions for Photronics' Sub-Wavelength Reticle Solutions platform. "As semiconductor device feature sizes shrink below the exposure wavelength of the lithography tools used to pattern them, demand for advanced reticle technologies will continue to accelerate," said Constantine "Deno" Macricostas, chairman and chief executive officer of Photronics in Jupiter, Fla. He said investments in IBD-LDD technology will help to differentiate Photronics development of new sub-wavelength photomask processes. The two companies did not release details about the purchase of the Nexus tool or financial arrangements in the development partnership.