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Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?

To: ScotMcI who wrote (25615)	1/9/2002 8:57:01 AM
From: ScotMcI	Read Replies (2) \| Respond to of 25960

Cymer Launches ELS-7000 Excimer Light Source, Extending KrF Technology Down To Sub-130-Nanometer Regime Company Receives Orders in Excess of $14 Million for Multiple Units From Major Customers SAN DIEGO, Calif., Jan. 9 /PRNewswire-FirstCall/ -- Cymer, Inc. (NASDAQ:CYMI), the world's leading supplier of excimer light sources used in semiconductor manufacturing, today unveiled its latest krypton fluoride (KrF) production light source-the ELS-7000(TM). Designed for next- generation lithography applications at the 248 nm wavelength, the ELS-7000 will be a key enabler in the production of devices with sub-130 nm design rules. By also providing the highest spectral power of any Cymer KrF light source, the ELS-7000 fulfills customers' demand for a 4kHz KrF system that addresses their increasingly aggressive performance and cost requirements. As evidence of this, Cymer has already received multiple-system orders for the ELS-7000, exceeding $14 million, from several of the top companies in the semiconductor industry. Shipments to these global customers are expected to commence in Q1 2002. According to G. Dan Hutcheson, chief executive officer of San Jose, Calif.-based market research firm VLSI Research, Cymer's latest KrF light source will open a new window of opportunity by giving the industry the option to extend KrF lithography down to 130 nm geometries and below. "To meet heightened demands on equipment capability, integrators will need a highly line-narrowed, high-power, high-repetition-rate KrF excimer light source that will allow them to reduce geometry sizes, improve throughput, and reduce operating costs at the 248 nm wavelength," Hutcheson said. "The ELS-7000 is representative of Cymer's continuous commitment to developing the enabling technologies essential to the production of next-generation devices. More importantly, it reveals the company's foresight in developing the technology that lithography-tool manufacturers and chipmakers need to continually keep pace with Moore's Law and maintain their competitive positions without increasing risks or operating costs." This latest addition to Cymer's industry-leading portfolio is the most advanced KrF light source to date. The ELS-7000 provides customers with the flexibility to "mix and match" the KrF and ArF products to accommodate multiple deep-ultraviolet (DUV) wavelengths-in this case, 248 and 193 nm-in the same manufacturing environment. The products' shared platform and 4kHz repetition rate will help customers realize ease-of-use and cost benefits when employing them together. Pascal Didier, Cymer's president and chief operating officer, noted that this product launch and its associated purchase orders confirm that the industry is entering the "golden age" of DUV. "DUV lithography is a key technology driving smaller geometries and technological advancements in the semiconductor itself," said Didier. "The ELS-7000 offers more power for higher productivity and tighter bandwidth to extend KrF technology to sub-130 nm designs-enabling chipmakers to shrink the critical dimensions of integrated circuits, while minimizing operating costs." The new product is also testament to Cymer's ability to strategically leverage its R&D investment, to bring the most compelling technologies to market, and to fuel innovation throughout the technology industry by providing the means to keep shrinking the design geometries of today's and tomorrow's chips. ELS-7000 Technical Specifications Like its ArF sister product, the ELS-7000 operates at a 4 kHz repetition rate, enabling it to support the highest scan speeds for maximum productivity and wafer throughput. Improved thermal management and optimized gas flow in the discharge chamber allow the ELS-7000 to deliver 30 W output power. The light source also features Variable Energy and Repetition Rate Operation (VERRO(TM)) to increase process latitude, MicroInject(TM) to minimize operational downtime, and high-accuracy tuning technology for wavelength stability. As a result, the ELS-7000 can provide full imaging capability for 200 mm and 300 mm lithography scanners with >0.8 numerical aperture (NA) lens designs. The ELS-7000 delivers this higher level of spectral performance through a highly line-narrowed bandwidth of less than or equal to 0.5 pm at full-width half maximum (FWHM) and less than or equal to 1.4 pm at 95 percent energy integral. Forward Looking Statements Statements in this press release that are not strictly historical in nature are forward-looking statements. These statements include, but are not limited to, references to expected revenue for the ELS-7000 in 2002; the ELS- 7000 enabling production of devices with sub-130 nm design rules; the ELS-7000 enabling the extension of KrF lithography to 130 nm and below and giving integrators a KrF light source that will allow reduced geometries, improved throughput and reduced operating costs at 248 nm; and the shared platform and 4kHz repetition rate of the ELS-7000 and NanoLith 7000 helping customers realize ease-of-use and cost benefits when using them together. These statements are only predictions based on current information and expectations and involve a number of risks and uncertainties. Actual events or results may differ materially from those projected in such statements due to various factors, including but not limited to: the demand for semiconductors in general, and, in particular, for leading-edge devices with smaller geometries; the rate at which semiconductor manufacturers take delivery of photolithography tools from the company's customers; delays or cancellations by customers of their orders; new and enhanced product offerings by competitors; the timing of customer orders, shipments and acceptances; the ability of the company to meet its production and/or product development schedules; the ability of the company to secure adequate supplies of critical components for its advanced products; and the ability of by the company to manage its expense levels and unanticipated expenses. For a discussion of these and other factors which may cause our actual events or results to differ from those projected, please refer to the company's most recent annual report on Form 10-K and quarterly reports on Form 10-Q, as well as other subsequent filings with the Securities and Exchange Commission. About Cymer Cymer, Inc. is the world's leading supplier of excimer laser illumination sources, the essential light source for deep ultraviolet (DUV) photolithography systems. DUV lithography is a key enabling technology, which has allowed the semiconductor industry to meet the exacting specifications and manufacturing requirements for volume production of today's advanced semiconductor chips. Further information on Cymer may be obtained from the Company's SEC filings, on the Internet at www.cymer.com or by contacting the company directly.

To: ScotMcI who wrote (25615)	1/9/2002 9:35:36 AM
From: Robert Douglas	Read Replies (1) \| Respond to of 25960

Man this board is dead when a rise like we've seen recently doesn't get any postings. I've just been sitting back waiting. I had no intentions of selling my CYMI below $30 and probably not below $50. There are a number of reasons I am holding this puppy for the long haul. 1)Average price increases. It comes to 22% That's going to be a huge boost to sales and earnings during the next upswing. 2)Obsolescence, obsolescence, obsolescence. 3)"The Golden Age of DUV" (to quote Cymer's management) I really believe that it has arrived and Cymer is still on top of the industry. The penetration of this technology is going to be much higher in the next cycle.