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Politics : Formerly About Applied Materials -- Ignore unavailable to you. Want to Upgrade?

To: StanX Long who wrote (59032)	1/17/2002 9:40:09 PM
From: StanX Long	Read Replies (2) \| Respond to of 70976

ASML still predicts second half recovery after 2001 sales drop 40% Lithography backlog drops to 117 tools from 365 at start of last year Semiconductor Business News (01/17/02 08:38 a.m. EST) siliconstrategies.com VELDHOVEN, the Netherlands -- Photolithography giant ASML Holding NV today reported net sales declined 20% in the last half of 2001 to 820 million euros ($730 million) compared to 1.02 billion euros ($908 million) in the first six months of the year. For the entire year, ASML's net sales of 1.84 billion euros ($1.64 billion) were 40% below 3.1 billion euros ($2.76 billion) in 2000. Reiterating the company's 2002 outlook issued last summer, ASML's chief executive said, "As far as we can see, the upturn will not happen before the second half of 2002. "Although some signs indicate that we have passed the bottom, we feel it is too early to change our views," added Doug Dunn, president and CEO of the Veldhoven-based company. ASML reported its revenues for lithography systems totaled 1.55 billion euros ($1.38 billion) in 2001, a drop of 41% from 2.63 billion euros ($2.34 billion). The company sold 197 lithography systems last year vs. 455 in 2000. Of the units sold in 2001, 152 were step-and-scan tools while 45 were step-and-repeat systems, said the company. The company said the average selling price of its lithography tools increased 18% to 6.8 million euros $6.1 million compared to 5.8 million euros ($5.2 million) in 2000. ASML's lithography division ended 2001 with a sharply lower backlog of tool orders at 117 vs. 365 at the start of the year. ASML's track and thermal systems segment posted a 33% decline in net sales to 290 million euros ($258 million) in 2001 from 430 million euros ($383 million) in 2000. The

To: StanX Long who wrote (59032)	1/18/2002 1:04:54 AM
From: TI2, TechInvestorToo	Read Replies (1) \| Respond to of 70976

High NA 248nm wavelength steppers with full tricks ( OPC, PSM, off axis illumination)will do the bulk of the work at 100 nm node. The limited supply (production sold out-lol) of 193 steppers will be used for key layer(s) like gate in mix and match mode. This is not new news-just spun well.ASML recently had a release on 248 for 100nm. siliconstrategies.com 157nm exposure is even later although we were expecting it by now. Moores laws lives and it seems "optics forever". Good trading/investing TI2 PS-When I was a newbie fab rat 20+ years ago, we thought we needed xray to break thru 1 micron barrier. The joke became, "x ray-the technology of the future and it always will be" unless you rename euv- another great spin. PPS-back to stealth mode