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Politics : Formerly About Applied Materials -- Ignore unavailable to you. Want to Upgrade?

To: StanX Long who wrote (60179)	2/8/2002 3:23:58 AM
From: StanX Long	Read Replies (1) \| Respond to of 70976

DuPont Photomasks plans first 0.18-micron reticle line in China, seeks U.S. approval Semiconductor Business News (02/07/02 09:20 a.m. EST) siliconstrategies.com SHANGHAI -- U.S.-based DuPont Photomasks Inc. (DPI) today announced plans to become the first merchant supplier of lithography reticles to install a production line for 180-nm (0.18-micron) masks in China with a major expansion of its facility here. DuPont Photomasks said it will "anchor" the new photomask line with an Etec Systems Alta 3700 laser pattern generator, which will be supplied by Applied Materials Inc. Improvements to the existing facility and the export licensing process--required by the U.S. government--will begin in the current fiscal quarter, said DuPont Photomasks. U.S. export controls over advanced lithography technology in China have been a center point of debated in recent years. Under older export guidelines, 0.25-micron technology had been a limit under U.S. controls, but a number of chip-making startups, joint ventures, and major semiconductor manufacturers have announced plans for 0.18-micron and below fab processes in China during the past couple of years.