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To: Yousef who wrote (159740)2/22/2002 1:44:53 PM
From: Paul Engel  Respond to of 186894
 
Yousef - Re: ". With the higherK materials used for the gate
dielectric, then a thicker material can be used and gate "tunneling" can be reduced."

I know Intel is working on new gate dielectric materials. Do you know what company MAD is going to steal this new technology from?

Paul