Silicon Investor (SI) -- The First Internet Community

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Politics : Formerly About Applied Materials -- Ignore unavailable to you. Want to Upgrade?

To: StanX Long who wrote (61492)	3/6/2002 3:33:46 AM
From: StanX Long	Read Replies (1) \| Respond to of 70976

Cymer Unveils Technology for Next-Gen Litho Tools Online staff -- Electronic News, 3/5/2002 e-insite.net Cymer Inc. today introduced its dual-gas-discharge-chamber technology that it says is designed to meet the strict performance requirements of the next several generations of lithography tools. The Santa Clara, Calif.-based company provided details of the technology at the SPIE Microlithography conference this week in Santa Clara. According to the Cymer, its master oscillator power amplifier (MOPA) technology will allow next-generation light sources to deliver higher power, tighter bandwidth at lower costs for future optical lithography applications, including all three deep ultraviolet (DUV) wavelengths -- 248nm, 193nm and 157nm. Cymer said its technology is different from others because it separates the power and bandwidth generators. This allows chipmakers to achieve the higher throughput and smaller critical dimensions that are needed for next-generation DUV lithography. The company claims its dual-chamber design will allow for future light sources to reach very tight bandwidth performance at high power with lower consumable costs than those associated with existing single-gas-discharge chambers. "With the industry entering the golden age of DUV, the market for DUV light sources and consumables could grow to exceed $1 billion by 2005," said Pascal Didier, Cymer’s president and COO, in a statement. "With a view toward Cymer’s full participation in this projected growth, we’ve continued to pursue the technology innovation that the industry has come to expect from Cymer. As a result, we’ve made tremendous progress with our next-generation light sources, including MOPA and our 7000-series light sources, which will enable chipmakers to mix-and-match our DUV products in the fab."