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To: semiconeng who wrote (73860)3/7/2002 11:51:49 AM
From: Bill JacksonRead Replies (1) | Respond to of 275872
 
Semi, Do they use the same mask for a small area and then used it again and again. Logically a smaller sized CPU would get more on the mask. Let us say this mask holds a 3x3 grid of CPUs at .18 and a 4x4 grid at .13(these are arbitrary picks). Since it would take the same number of step and repeats to do the wafer unless exposure times varied with feature size?) then the throughput would be the same. It is also possible that with smaller features the machine takes more time to move and align for the exposure due to the smaller features?

If they made one huge mask that covered the whole wafer then edge effects would make problems and you may have to optimize the focus to minimize edge loss and that give you center losses?

Is it any better with reflective lenses versus transmissive lenses?

bill



To: semiconeng who wrote (73860)3/7/2002 1:45:49 PM
From: hmalyRead Replies (1) | Respond to of 275872
 
Semicongeng. Re.I just realized I may not have exactly answered your question. I think that you would need to have a significant shrink, in order to fit an additional die on the Mask. I USUALLY have not seen this happen.......<<<<<<<<<<

Excuse my ignorance, but when they scan, can they scan only one die at a time, a block of 2 or 4, or the whole wafer.


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