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To: dale_laroy who wrote (162106)	3/13/2002 7:13:28 PM
From: fingolfen	Respond to of 186894

You are probably right. Wouldn't it be interesting however, if AMD really could get to the 65nm node using 193nm laser lithography tools as they hope to? This would imply that they could reach 80nm using 248nm laser lithography tools, in which case 100nm would have made a reasonable intermediate step for mid-2003. Several problems with that... there is no 100nm or 0.10 micron node. It's now internationally known as the "90nm node." It's the same technology node everyone's been talking about for years, but it's been given a somewhat more representative name in the face of collapsing gate lengths. Mean gate lengths for 0.18 micron are ~100nm. Mean gate lengths for 0.13 micron are ~65-70nm. The 90nm node will utilize gate lengths on the order of 45-50nm. Contact is nasty too. I challenge anyone to actually do that in a repeatable fashion with 248nm lithography + etch tricks. If AMD is going with 248nm for the 90nm node, I DON'T envy the poor process engineers.