Silicon Investor (SI) -- The First Internet Community

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Politics : Formerly About Applied Materials -- Ignore unavailable to you. Want to Upgrade?

To: StanX Long who wrote (62068)	3/14/2002 1:47:16 AM
From: StanX Long	Read Replies (1) \| Respond to of 70976

Corning increases production for 193-nm lithography-lens materials Semiconductor Business News (03/13/02 15:42 p.m. EST) siliconstrategies.com SANTA CLARA, Calif. -- In a move to keep up with growing demand for its lithography-lens materials, Corning Inc. is aggressively ramping up production of these products in its new plant in Canton, N.Y. The plant will quadruple its overall capacity for calcium-fluoride materials used in 193-nm lithography lenses, said Gitimoy Kar, director of the Fluoride Crystals Business Unit at Corning, in an interview at last week's SPIE Microlithography conference here. The company's $30 million plant in Canton was originally announced last year (see Jan. 9 story ). The Corning-based company is also producing 193-nm lens materials at another plant in North Brookfield, Mass. The plants will enable the company to keep up with greater-than-expected demand for its materials. Earlier last year, there was a chronic and severe shortage of calcium-fluoride material, which delayed the shipments of new exposure tools based on 193-nanometer argon-fluoride (ArF) laser technology (see March 2 story ).