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Politics : Formerly About Applied Materials -- Ignore unavailable to you. Want to Upgrade?

To: StanX Long who wrote (63878)	5/17/2002 2:07:24 AM
From: StanX Long	Read Replies (1) \| Respond to of 70976

Infineon, AMD, DuPont Photomasks Partner for Photomask Production Online staff -- Electronic News, 5/16/2002 e-insite.net The companies said they have established a joint venture in Dresden, Germany, to develop and produce photomasks. DuPont Photomasks also announced a 10-year photomask supply deal with Infineon. Infineon Technologies AG, Advanced Micro Devices Inc. (AMD) and DuPont Photomasks Inc. today said they intend to establish an advanced photomask facility in Dresden, Germany, that will be used to develop and produce next-generation photomasks. The facility, which will be used for pilot-manufacturing of next-generation lithographic photomasks, will be jointly operated by the three companies under a new venture called Advanced Mask Technology center GmbH & Co. KG (AMTC). The AMTC Dresden plant will also be the site of a new commercial photomask production facility that DuPont Photomasks will establish as a separate business. The AMTC plant has useable floor space of 17,500 square meters and it will be built near Infineon’s and AMD’s Dresden-based semiconductor fabs. The facility is expected to be complete in early 2003. Once the building is complete, AMTC and DuPont Photomasks said they plan to install equipment so they can begin operations in the second half of 2003. Investment needed for the facility is estimated to be about $328 million (360 million euros) over the next five years. Infineon already operates a photomask development and production facility with about 230 employees in Munich, Germany, producing masks exclusively for its own production facilities. Infineon said this new collaborative production plan would help speed design and development cycles. AMTC plans to employ about 170 people, with engineers from each of the three companies expected to join AMTC to develop a roadmap for technology nodes of 90 / 65 nanometers and below.