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To: StanX Long who wrote (64217)	6/5/2002 2:35:51 AM
From: StanX Long	Read Replies (1) \| Respond to of 70976

KLA-Tenor rolls out tool to measure gate dielectrics in real time Semiconductor Business News (06/04/02 18:25 p.m. EST) siliconstrategies.com SAN JOSE -- KLA-Tencor Corp. today introduced its latest non-contact, in-line electrical monitoring and characterization tool for controlling gate dielectric processes at the 130-nm (0.13-micron) node and below. The Quantox XP tool from KLA-Tencor provides accurate electrical measurements of gate dielectric performance in the production line using a patented, non-contact technique, according to the San Jose-based company. The tool provides greater than 95% correlation to electrical test data, enabling chip makers to predict transistor performance in-line. This is handled via the company's “Activ” technology, which provides accurate and comprehensive information on the physical and electrical properties of gate dielectric material in real time. It also enables