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Technology Stocks : Rudolph Technologies Inc-(RTEC) -- Ignore unavailable to you. Want to Upgrade?


To: Road Walker who wrote (56)7/10/2002 4:13:21 PM
From: Proud_Infidel  Respond to of 106
 
Rudolph's CEO addresses the IC metrology maze
Semiconductor Business News
(07/10/02 15:58 p.m. EST)

In the IC industry, metrology has become more and more critical, especially as chips move towards smaller geometries. The shift towards copper-interconnects, low-k, and other technologies is also creating new challenges for metrology tool makers. To get a handle on the technical and business trends, SBN talked to Paul McLaughlin, chairman and CEO of Rudolph Technologies Inc., a Flanders, N.J.-based supplier of metrology tools.

SBN: How do you see the metrology sector changing?

McLaughlin: We think there's going to be consolidation within metrology. Whenever you go through a downturn, there's a run to safety. That's something we have tried to concentrate on here, which is to equate safety with a strong infrastructure. We're going to see more of that. When you have terrific technology it will get you in the door, but if you don't have the infrastructure to support it, you'll lose business. The reason for that is safety.

People are getting less comfortable with betting on smaller companies. That will probably become more significant as the cost of each wafer goes up. The cost of the 300-mm wafer and the product on it is staggering, you cannot afford to risk it on companies that don't have the support structure. In other words, you must have 24/7 global support for applications and field service.

SBN: How has the downturn in the semiconductor industry affected chip-equipment makers like Rudolph?

McLaughlin: The downturn has not passed us by. Our products have gone from being both a capacity and a technology buy a few years ago to being only a technology buy this past year. That means our revenues have dropped. Last year they declined nearly 10%, which is much better than the industry average, but still, it did decline. We gave guidance to Wall Street that we believed fourth quarter last year was the bottom, and we up ticked the first quarter this year. We're giving guidance for the second quarter that it too will be up. So we think the worst is behind us.

SBN: What technology trends is Rudolph watching?

McLaughlin: If you look at today's Pentium [from Intel Corp.], it has on the order of 50 million transistors on it. By the end of the decade, they're projecting there will be one billion transistors on each chip. To get there, you can no longer use glass, or SiO2 as the gate oxide. Eventually a metal gate electrode will also be required. I think it's clear on the [ITRS] roadmap that customers will need to figure out a way to manufacture advanced gates.

SBN: What is the role of integrated metrology in all of this?

McLaughlin: There is a role for integrated metrology, maybe not in-situ, but integrated metrology. There are different types of metrology in this business: in-situ measures while the process is running; integrated measures inside the system tool; and stand-alone metrology measures outside the system tool.

The next generation, 300-mm processing, will have integrated, but not necessarily in-situ metrology. It's too difficult to do these things in plasmas and while the deposition process is underway. But, you want to do it immediately thereafter and have the metrology technique in the system tool itself, so you'll go with integrated metrology.

It will start slow; integrated metrology is a small market right now, but at the 300-mm node, it will take a bigger piece. Integrated metrology has multiple components; it's not just integrated reflectometry. We'll see integrated ellipsometry, scatterometry, and a number of different technologies that will be integrated going forward. It won't be the big revenue piece for years, but it'll be a significant part of the business in two or three years.

SBN: Where does Rudolph's technology fit into the semiconductor manufacturing process?

McLaughlin: Rudolph is a process control company that sells production thin-film metrology equipment, mainly for the semiconductor production arena. We offer metrology solutions for both opaque and transparent films.

SBN: What kind of products do you offer and what are you showing at Semicon West?

McLaughlin: Besides our integrated metrology tools, we will also show our strength in the copper arena. Our growing orders for MetaPULSE-II and decreasing orders for the original MetaPULSE tool indicates that the industry is moving increasingly to copper. If I look at my backlog today, I've got more backlog in MetaPULSE-II copper than I do in MetaPULSE. The specs for this new tool are compelling: you can do 50% dense line measurements, you can do ultra low-k film measurements, you can measure today's multi-layer barriers and tomorrow's thinnest metal films.

SBN: Are there emerging trends in your market?

McLaughlin: One technology I see emerging is a convergence of transparent and metal film metrologies. The new films and film stacks being fabricated will require multiple technologies to be successful. That means metal and transparent metrologies are getting closer together and you'll need both capabilities on a single tool.

Rudolph has the unique ability to provide this with our metal film capabilities. We are the only ones who can combine metal metrology with transparent film metrologies like ellipsometry, reflectometry, DUV, etc. Cluster tools will become more important, and customers will want to put down multiple, different films before they take a wafer out of the cluster tool. You will have to be able to measure all those films, which may be transparent, or opaque, or both, at the same time. Those who can measure such film stacks on a single metrology platform will have a competitive advantage, from both a cost-of-ownership and a throughput view.

SBN: Tell us about Rudolph's growth strategy.

McLaughlin: Last year, 82% of our sales came from products we didn't have two years ago. We're a technology-based company, and we believe we are setting ourselves up to be the standard metrology of choice for copper measurement. At present, more than 75% of all the IDMs that have copper processes are using Rudolph equipment.

SBN: What has been Rudolph's strategy during the downturn?

McLaughlin: During the downturn our strategy has been to work closely with those customers who spend for technical innovation and quality even during downturns. We have concentrated on the top 20 semiconductor makers. In fact, Rudolph has systems in 14 of the top 16 companies, and all of the top 10 chipmakers have picked Rudolph for opaque thin-film metrology.

A second factor that has taken hold over the past two years is our presence in the foundry segment. Historically we've been strong in Taiwan, and that has new importance with the growth of the foundry business. We' are a strong believer in the foundry business model. I believe that the total foundry market will be more important than the total memory market, probably in less than 30 months.

Granted it's less than half that size now, but it will grow quickly. The foundry model is so sound that it will take off at the 300-mm technology node. It's just so compelling that I think they're going to get customers that they have never had before. You have to concentrate on the top foundries and Rudolph has done so.

SBN: What are your observations about the foundry industry?

McLaughlin: The top three--TSMC, UMC, and Chartered-- are significant in that they have changed their business model by adding an R&D component. They used to buy technology and were essentially only a manufacturing company. When they did R&D, it was limited to process manufacturing. They used to look at improving the process, but now they're looking at technology nodes. They're leading in things like copper, 0.13-micron, and low-k dielectrics. They're at the front of the pack--right there with the global semiconductor leaders. They have put a few more percent per dollar into their R&D operating model and they've devoted that to the latest technology.

SBN: Do you see the foundry model as key to the industry's recovery?

McLaughlin: I think it will be, but it will only be one part. You have to look at the market in segments; geographic slices and product slices. In terms of product slices, we're going to see some excitement in the rising area of flash memory. I also see several other product slices in the logic area that will be strong going forward at the end of this year and into 2003. Telecomm will recover more slowly. We'll see the market come back by segments and not in lock step.

When you look at the recovery in geographic slices, you realize you have to be a player in China. Two-thirds of the capital expenditures this year in China were from just two companies: Grace and SMIC. It's important to play at both of those, and I'm happy to say we are. The global business right now mirrors the memory business: if you can't play at the top three, there is only a third of the market, or less, left. So you have to play at Micron, Samsung, and Infineon, and we do.



To: Road Walker who wrote (56)7/23/2002 8:44:24 AM
From: Proud_Infidel  Respond to of 106
 
Rudolph Technologies Enters Billion $ Defect Market; Acquires ISOA
FLANDERS, N.J., July 23 /PRNewswire-FirstCall/ -- Rudolph Technologies, Inc. (Nasdaq: RTEC - News), a worldwide leader in process control metrology systems today announced that it has entered into a definitive agreement to acquire privately held ISOA, a defect control company based in Richardson, Texas. The acquisition is an all cash transaction valued at approximately $27.5 million. The deal is expected to close within 90 days and is anticipated to be accretive to earnings per share in the first quarter of 2003.

ISOA is a spin-off from Texas Tech University's International Center for Informatics Research (formerly the Institute for Studies of Organizational Automation). Over the past 16 years, ISOA has licensed its technology for use in the semiconductor industry and recently began transitioning to a semiconductor capital equipment supplier. The Company's core technologies are Knowledge Based Algorithms used in wafer macro defect detection and classification. Customers in Asia, Europe and the U.S are currently using its recently introduced WaferView family of tools. The technology improves semiconductor chip manufacturer's process yields, reduces inspection costs and maximizes efficient production for increased profits. Following the completion of the transaction, ISOA will continue to maintain its offices in Richardson, TX and will become the Yield Metrology Group of Rudolph. Additionally, ISOA's tool manufacturing currently outsourced to Japan, will be moved to Rudolph's Ledgewood, New Jersey facility. ISOA currently has approximately 40 employees with one third holding advanced degrees.

"This acquisition represents a major step in our goal to expand Rudolph's product offerings and a key milestone in our continuing goal to bring leading-edge metrology solutions to our global customers," commented Paul F. McLaughlin, Chairman and CEO of Rudolph Technologies. "As a result, we are entering the billion dollar wafer inspection market with a portfolio of products and services that are recognized as being among the best technically in the industry. Our industry-leading MetaPULSE(TM) family of tools shows our past success at commercializing technology that has come out of a university setting and we fully expect to duplicate that success for ISOA's WaferView tools. We are confident of the cross-sell opportunities given that ISOA has penetrated just two of the top-ten semiconductor manufacturers due to its limited sales force. Conversely, Rudolph works in close collaboration with all of the top 10 and 14 of the top 16 largest device manufacturers worldwide."

Dr. Kathleen Hennessey, CEO of ISOA, will continue to lead the operations as Vice President and General Manager of the Yield Metrology Group, reporting to Paul F. McLaughlin. Dr. Hennessey has over 35 years experience specializing in knowledge-based systems, artificial intelligence, databases and data communications. She and Dr. YouLing Lin, Chief Technology Officer and VP Engineering of ISOA will be among the 11 ISOA founders that will be joining Rudolph.

"By leveraging Rudolph's existing infrastructure and ability to get in front of the leading semiconductor manufacturers, we will be in a position to accelerate our market penetration and bring added value to our prospective customer base," commented Dr. Hennessey. "Furthermore, Rudolph remains on the cutting-edge in terms of anticipating trends and customer demands, and our roster of engineers are anxious to collaborate with Rudolph's group of talented experts."

Conference call

Rudolph Technologies will host a conference call to discuss the acquisition today, July 23, 2002, at 4:30 p.m. EDT. To participate in the conference call, please dial (706) 643-3802. A live webcast will be available at www.vcall.com. A replay of the conference call will be available approximately two hours after the call until 11:59 p.m. EDT on July 30. To access the replay, please dial (706) 645-9291, and use passcode 5011832.

About ISOA

Emerging from a spin-off in 1994 from the Texas Tech University, ISOA has pioneered patented image analysis technologies and proprietary classification software. The Company's machine vision technologies detect wafer defects enabling semiconductor chip manufacturers to take corrective action immediately, resulting in rapid ramp-up to high volume manufacturing with high process yields. ISOA's innovative technology enables it to respond to the changing needs of the semiconductor industry and positions the Company to become a recognized leader of yield metrology solutions.

About Rudolph Technologies

Rudolph Technologies is a worldwide leader in the design, development, manufacture and support of high-performance process control metrology systems used by semiconductor device manufacturers. The Company provides a full-fab solution through its families of proprietary systems for both transparent and opaque thin film measurement. Rudolph's product development has successfully anticipated and addressed many emerging trends that are driving the semiconductor industry's growth. The Company's success in creating complementary metrology applications through aggressive research and development is key to Rudolph's strategy for continued technological and market leadership.

This press release contains forward-looking statements, including statements related to our earnings expectations for the first quarter of 2003 and our anticipated leadership position in the industry. Actual results may differ materially from those projected due to a number of risks, including the impact of the slowdown in the overall economy and the uncertainty of the current global political environment following the recent terrorist attacks, changes in customer demands for our existing and new products, the timing, cancellation or delay of customer orders and shipments and the timing of revenue recognition of shipments, new product offerings from our competitors, changes in or an inability to execute Rudolph Technologies' business strategy, unanticipated manufacturing or supply problems, changes in tax rules, and inability to integrate ISOA. Rudolph Technologies cannot guarantee future results, levels of activity, performance or achievements. The matters discussed in this press release also involve risks and uncertainties summarized under the heading "Risk Factors" in Rudolph Technologies' Form 10K filed for the year ended December 31, 2001. These factors are updated from time to time through the filing of reports and registration statements with the Securities and Exchange Commission. Rudolph Technologies does not assume any obligation to update the forward-looking information contained in this press release.

SOURCE: Rudolph Technologies