To: BWAC who wrote (3161 ) 9/23/2002 8:18:55 AM From: Proud_Infidel Respond to of 25522 Applied Materials' Quantum II System Boosts Implant Productivity for Soitec's SOI Manufacturing Enhancements in Quantum(TM) II Ion Implanter Enable Speedier Cycle Time for Smart Cut(R) Process Monday September 23, 7:30 am ET SANTA CLARA, Calif.--(BUSINESS WIRE)--Sept. 23, 2002-- Applied Materials, Inc. announced that Soitec has achieved a significant reduction in cycle time for its 300mm Smart Cut® SOI (silicon-on-insulator) process as a result of key enhancements made by Applied Materials in its Quantum(TM) II ion implant system. By increasing the system's hydrogen beam currents across a wide range of energies, Applied Materials was able to boost system productivity by 50 percent. Emmanuel Arene, director of operations at Soitec, said, "We have used Applied Materials' ion implant technology for years in our 200mm Smart Cut process and we rely on the company to support our leading-edge SOI technology. The Quantum II systems, which were installed in our new 300mm Bernin 2 production line, allow us to reach a throughput of 17 wafers per hour on 300mm thin SOI wafers, despite the larger implanted area and smaller batch size. This is especially significant for 300mm manufacturing of SOI substrates to be used for fully depleted SOI transistor structures. We continue to work with Applied Materials on system improvements and expect further breakthroughs in productivity and quality to meet long term market expectations." SOI technology is used to create an insulating film layer under a thin layer of very pure silicon. This technique has been shown to increase performance in many chip designs by up to 25 percent compared to devices made with traditional bulk silicon. The Quantum II system addresses the industry's requirement for thinner silicon layers in SOI wafers, which demand lower energy implants. Normally, reducing ion implant energy levels means a loss of system throughput; however, the innovative extraction and ion beam technology used in the Quantum II actually allows higher throughput than was possible in earlier generations of the system at higher energies. With this higher throughput, Soitec can process more wafers with fewer systems, improving factory output and productivity. Source lifetime on the Quantum II system is greater than 1,000 hours, leading to excellent process and uptime performance. "Soitec has been one of our most valued customers for many years, and we are pleased to see increased demand for their SOI technology worldwide," said Craig Lowrie, vice president and general manager of Applied Materials' Ion Implant Division. "We have worked hard to meet the increasingly tight implant process requirements imposed by Soitec's rapid advances in SOI fabrication technology. Our latest generation Quantum II system demonstrates our ability to simultaneously improve both process performance and productivity." Applied Materials' Quantum systems feature a small-footprint platform that bridges 200mm and 300mm wafer sizes. The Quantum-series ion implanters cover the entire "conductive" implant spectrum used in transistor fabrication, as well as the specialized hydrogen implant technology used by Soitec in its SOI manufacturing process. Soitec is the world's leading manufacturer and supplier of SOI wafers. Soitec uses its exclusive Smart Cut process, based on hydrogen ion implantation, to transfer a thin layer of material on the top of a support wafer. Soitec is traded on the French "Nouveau Marche" at the Paris Stock Exchange under the SICOVAM number 7206. Soitec's web site is www.soitec.com. Applied Materials, the largest supplier of products and services to the global semiconductor industry, is one of the world's leading information infrastructure providers. Applied Materials enables Information for Everyone(TM) by helping semiconductor manufacturers produce more powerful, portable and affordable chips. Applied Materials' web site is www.appliedmaterials.com.