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Technology Stocks : Semi Equipment Analysis -- Ignore unavailable to you. Want to Upgrade?

To: robert b furman who wrote (6679)	11/3/2002 10:48:45 PM
From: Cary Salsberg	Read Replies (1) \| Respond to of 95530

RE: "Some areas of exceptional growth will be hitched up with Intels transition to 90 nanosecond linewidths by the end of 2004..." and "Some beneficiaries may be : Genus- and their ALD thin film techniques. VSEA - Ion implantation techniques Cohu - Test handler cooling ugradekits to prevent intest meltdowns Egls - Internet based quality control and machine self adjustments??" I think that the key to moves to .09 micron linewidths will be lithography. 240nm tools were made to work down to .13 micron, but 193nm tools will most likely be required at .09. I certainly would look at ASML and CYMI before the list you posted and I think you need many more ? for EGLS.