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Technology Stocks : KLA-Tencor Corporation (KLAC) -- Ignore unavailable to you. Want to Upgrade?

To: SemiBull who wrote (1709)	2/24/2003 7:50:11 PM
From: SemiBull	Read Replies (1) \| Respond to of 1779

KLA-Tencor rolls out advanced CD SEM By Semiconductor Business News Feb 24, 2003 (3:39 PM) URL: siliconstrategies.com SAN JOSE--KLA-Tencor Inc. here today rolled out its most advanced CD scanning electron microscope (SEM) metrology tool for sub-100-nm chip production. The tool, dubbed the eCD 1, is designed for applications involving 193-nm lithography and very high-aspect ratio (VHAR) structures. A 200-/300-mm bridge tool, the eCD 1 features a throughput at 55 wafers per hour, according to the San Jose-based company. The eCD 1 incorporates a new electron-beam column and high-precision stage. It also includes ImagePlus, a technology that provides control over resolution and depth of focus to optimize tool performance on features with severe topographies. It also includes FlexScan, a new off-axis tilt capability. The technology enables the eCD 1 to generate 3-D profile information on certain features, thereby providing enhanced in-line process control.