To: Kirk © who wrote (7132 ) 9/11/2003 8:20:42 AM From: Proud_Infidel Read Replies (1) | Respond to of 25522 Applied obtains DARPA funds for new e-beam tools By Mark LaPedus Silicon Strategies 09/10/2003, 10:30 PM ET MONTEREY, Calif. -- Amid growing speculation that it has dropped its existing electron-beam, reticle-writer tool line, Applied Materials Inc. today (Sept. 10, 2003) disclosed it has received funding from the Defense Advanced Research Projects Agency (DARPA) for use in developing next-generation, e-beam machines. Reports surfaced at the Bacus Symposium on Photomask Technology in Monterey that Applied has scrapped its existing e-beam for use in advanced photomask production. Applied's e-beam is based on a "raster shaped beam" (RSB) technology for 65-nm chip designs and beyond. Sources added that the company will continue to develop and sell its pattern-generation tools for advanced mask making. But instead of selling its existing e-beam line, Applied is now working on two separate tools, including a multi-beam, e-beam product and a combination e-beam/pattern-generation machine, according to sources. Gilad Almogy, corporate vice president in charge of Applied's e-beam unit, Etec Systems Inc. of Hayward, Calif., denied the company has dropped its existing e-beam. "We're still supporting it and we are working on future tools," he said in an interview with Silicon Strategies at Bacus. Almogy added that there has been some "restructuring" within Etec, including a move to shift the service headquarters from Hayward to Hillsboro, Ore. He added that Applied has received funding from DARPA to develop next-generation products, but he did not elaborate. Sources believe that it is working on a multi-beam, e-beam and a combination e-beam/laser tool. Some speculate that the tools are geared for both photomask and maskless applications.