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Technology Stocks : ASML Holding NV -- Ignore unavailable to you. Want to Upgrade?

To: Kirk © who wrote (860)	10/27/2003 9:35:18 PM
From: SemiBull	Read Replies (2) \| Respond to of 43481

ASML Optics unveils new metrology technology By Silicon Strategies 10/27/2003 2:00 PM EST URL: siliconstrategies.com VELDHOVEN, the Netherlands -- ASML Optics today (October 27, 2003) announced its first product--a metrology technology that enables reliable measurements of dimensions approaching the atomic scale. Engineers and scientists are finding that traditional measurement systems based on interferometer techniques are unable to keep up with advancing technology. ASML's so-called PerfectWave metrology standard helps solve this problem, because it is almost incomprehensibly flat--variation is just 1 nanometer, or about 10 atomic layers, across its 4-inch diameter. This consistency provides a new "gold standard" for calibration of advanced interferometer measurement systems, enabling a 5x increase in their accuracy. "The PerfectWave metrology standard will also enable other industries to measure more accurately, a vital capability in the up-coming era of nanotechnology applications," said Thomas Polzer, managing director of ASML Optics, a unit of ASML Holding NV of the Netherlands. Founded in 2001, ASML Optics was part of the former Tinsley Laboratories unit. In 2001, ASML acquired Silicon Valley Group Inc. (SVG) and SVG's optics unit, Tinsley, for $1.6 billion. Tinsley develops sophisticated optics for the Hubble Space Telescope, as well as SVG's (now ASML's) mask projection scanners.

To: Kirk © who wrote (860)	10/30/2003 12:37:55 PM
From: Proud_Infidel	Read Replies (1) \| Respond to of 43481

ASML planning NGL day for financial analysts By Peter Clarke Silicon Strategies 10/30/2003, 10:04 AM ET VELDHOVEN, The Netherlands -- ASML Holding NV is planning to hold a one-day meeting with financial analysts on November 13 to discuss, among other topics, next generation lithography. Although no information could be found about this at ASML's website a company spokesperson confirmed that the event is in preparation. The spokesperson said the agenda is not yet finalized but that she expected 157-nm lithography, immersion lithography and the recently introduced Twinscan XT:1250 lithography machine (see October 21 story) would be among the subjects under discussion. The spokesperson said the event was only open to financial analysts but that the presentations given on the day would be made more generally available after the event.

To: Kirk © who wrote (860)	11/12/2003 11:43:30 AM
From: Proud_Infidel	Read Replies (1) \| Respond to of 43481

ASML to claim 157-nm immersion capability at analysts' meeting By Peter Clarke Silicon Strategies 11/12/2003, 6:32 AM ET VELDHOVEN, The Netherlands -- Dutch chip equipment maker ASML Holding NV said Wednesday (November 12, 2003) that it is able to apply 'immersion' to 157-nanometer wavelength lithography to extend that chip making technology below the 45-nm manufacturing process node. The claim is made in addition to mention of nearer-term plans to extend 193-nm lithography with immersion. The company made its announcement one day before a meeting with investors and financial analysts to be held in Veldhoven intended to discuss, among other things, the results of a fast-track R&D program in immersion (see October 30 story). Although the extension of 193-nm lithography by using water between the wafer and the last lens has become a popular topic of discussion, none of the lithography companies has formally announced product plans, although AMSL may change that on Thursday (November 13). The 193i technology was seen as an alternative to the next-generation of dry lithography at the 157-nm wavelength, a technology to which AMSL was strongly commited, adding to uncertainty in the market. In addition, no consensus has formed around a suitable liquid for use at 157-nm, a wavelength for which water is not suitable. If ASML or any of its research partners have identified a liquid and done any meaningful work in this area it would represent a significant change in the lithography landscape. ASML said that at the meeting it would provide an updated technology roadmap, and review cost-cutting measures in operations. ASML began a cost reduction program in July 2002, which was added to in mid 2003 (see July 16 story). The possibility of extending 193-nm dry lithography by replacing the air between the silicon wafer and the lens with water has been proposed only relatively recently. As a result long-lead time research groups, such as ASML's European research partner IMEC, have yet to begin formal programs to study the possibility. ASML began testing the possibility of immersion on its Twinscan lithography systems early in 2003, and said market researchers estimate the market for these immersion tools to grow to $230 million a year by 2005 from zero today. Since then senior ASML executives have dropped hints about good progress in immersion without making a formal announcement (see October 16 story). Such an announcement might have undermined the company's previous strong commitment to 157-nm dry lithography. ASML is due to announce on Thursday that using Twinscan immersion lithography machine allows metrology and overlay to be done in the dry while lithography is done under liquid and that its research has shown that the existing 193-nm lens system has proved easy to adapt for immersion without a redesign. At the meeting IMEC is scheduled to present a synopsis of its 157-nm lithography research, although this has been mainly based on a Micrascan VII lithography machine. It remains to be seen whether this will include any reference to an immersion extension.