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Technology Stocks : ASML Holding NV -- Ignore unavailable to you. Want to Upgrade?

To: Proud_Infidel who wrote (869)	11/13/2003 10:28:58 AM
From: Proud_Infidel	Read Replies (1) \| Respond to of 43484

ASML's 157-nm immersion litho plans remain fluid By Peter Clarke Silicon Strategies 11/13/2003, 7:00 AM ET LONDON -- It appears that ASML Holding NV did not identify a suitable liquid for 157-nm immersion lithography nor discuss the detail of any of the work that the company is doing in that area, at the financial analysts' lithography day held in Veldhoven, The Netherlands, Thursday (November 13, 2003). However the lithography equipment supplier did put 157-nm immersion lithography on its roadmap as being part of the next step in a commercial immersion offering in one diagram, although in another the company showed that a final decision on whether to execute on 157-nm wavelength immersion lithography would be made mid-2004. Jos Benschop made a presentation on the topic of immersion lithography in which the development of commercial tools for both argon fluoride (ArF 193-nm wavelength lithography) and F2 (157-nm wavelength lithography) were classified as the third and next step to follow some time after the fourth quarter of 2003. However, while Benschop spent the majority of his powerpoint slides talking about the development of AMSL's Twinscan AT:1150i scanner for immersion using 193-nm wavelength light, references to 157-nm immersion lithography took the form of a 'to-do' list that included: the need to find suitable immersion liquid; adapt existing lenses and process development tools; develop new lens designs with numerical aperture greater than 1.0. Benschop did say in the presentation that ASML had worked with International Sematech and un-named materials suppliers in the first phase of its immersion development program, prior to April 2003 to identify a suitable fluid for 157-nm immersion lithography. The presentation also referenced work by scientists at DuPont Co. central research (Wilmington, Del.), who earlier this year reported that they had found a way to extend immersion techniques to the 157-nm lithography generation (see September 8 story). Benschop's and other presentations from the ASML financial analysts' meeting could be found here when this story was first posted.