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Technology Stocks : ASML Holding NV -- Ignore unavailable to you. Want to Upgrade?

To: Proud_Infidel who wrote (874)	11/19/2003 12:41:06 PM
From: Proud_Infidel	Respond to of 43499

Dainippon to provide 'track' for ASML lithography By Peter Clarke Silicon Strategies 11/19/2003, 6:41 AM ET VELDHOVEN, The Netherlands -- ASML Holding NV and Dainippon Screen Manufacturing Co. Ltd. have entered into an agreement to develop so-called 'litho-clustering' methods, ASML said Wednesday (November 19, 2003). A litho-cluster is the linking of the 'track' and lithography systems used in semiconductor manufacturing. As a primary part of the agreement Dainippon Screen is to install track systems in the ASML development laboratory in Veldhoven. Current integration methofs use basic wafer transfer resulting in inconsistent timing between the processes and slower throughput, ASML said. The joint program is intended to create interface controls for tracks and scanners so that function more as a single system. The work is also intended to explore process and performance enhancements that might result from this. "Increased sophistication of the track and scanner interface will be necessary to meet future lithography requirements and provide our customers with the technology and productivity enhancements they need," said Takashige Suetake, president and chief operating officer of Semiconductor Equipment Company, Dainippon Screen, in a statement issued by ASML. "Customers should soon see such improvements as increased productivity and line-width control in their litho-cluster performance resulting from collaborations between lithography and track suppliers," said Martin van den Brink, executive vice president, marketing and technology, ASML. The two companies are looking to optimize the performance of high-numerical 193-nm wavelength lithography, immersion 193-nm and 157-nm lithography. In addition, the collaboration will develop automated process control systems using trackside integrated metrology units.