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To: Proud_Infidel who wrote (877)11/28/2003 9:14:01 PM
From: Proud_Infidel  Read Replies (1) | Respond to of 43452
 
ASML Takes Orders for Immersion Lithography

By David Manners -- Electronics Weekly, 11/26/2003

Dutch chip equipment maker ASML is taking orders for its first lithography tool that uses the new immersion technology.

"We are open for orders for prototype tools,” ASML's CEO Doug Dunn told Electronics Weekly at the MEDEA+ Forum 2003 in Berlin this week.

"Immersion technology extends 193nm wavelength tools to resolve 60nm feature sizes and 157nm wavelength tools to resolve 45nm feature sizes,” Dunn said.

The value of immersion technology is that it postpones the point at which the industry has to adopt the very expensive extreme ultra-violet (EUV) tool.

This is particularly helpful because, as Peter Tischer, vice-chairman for technologies at MEDEA+ told the forum, "the difficulties of EUV development are very high." He cited the lack of commercial availability of suitable light sources and reflective masks and optics.

So immersion technology saves the industry from a stalled process road map. Dunn reckons it will take a year for immersion tools to be used in volume production.

Immersion technology involves putting water on the base of the lens of the lithography tool and on the surface of the wafer and exploiting the refractive index of water (1.4) to bend the beam.

Electronics Weekly is the London-based sister publication of Electronic News.