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To: Proud_Infidel who wrote (918)2/23/2004 8:29:52 AM
From: Proud_Infidel  Respond to of 43397
 
Dai Nippon Printing signs to use ASML's CPL technology
By Peter Clarke
Silicon Strategies
02/23/2004, 7:35 AM ET

SANTA CLARA, Calif. -- ASML MaskTools Inc. has formed an alliance with Dai Nippon Printing (DNP) on the 'Chromeless Phaseshift Lithography (CPL) resolution enhancement technique, ASML MaskTools said Monday (February 23, 2004).

CPL is designed to increase the productivity of lithography processes by as much as 40 percent compared with competing technologies as well as enhancing resolution capability.

ASML MaskTools agreed to partner with Photronics Inc. and let Photronics make masks based on CPL in December 2003. ASML has now signed a leading Japanese mask maker to CPL.

DNP has already delivered a number of CPL test masks with positive results. ASML MaskTools would provide DNP with an R&D license for its CPL patents, the company said.

CPL is a single mask, single exposure resolution enhancement technique, which reduces the lithography system k1 value and that can be applied to logic and memory devices and is primarily targeted toward critical gate and contact layers.

"This is an exciting time to join forces with ASML MaskTools as it pioneers critical advancements in low k1 lithography," said Naoya Hayashi, general manager of DNP's electronic device laboratory, in a statement issued by ASML MaskTools.

"Collaborating with DNP and other industry leaders has resulted in a complete CPL solution flow. All the necessary elements are now in place for the adoption of CPL by chip manufacturers and foundries," said Dinesh Bettadapur, president and chief executive officer of ASML MaskTools, in the same statement.