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To: Proud_Infidel who wrote (942)	7/19/2004 12:42:34 PM
From: Cary Salsberg	Respond to of 43481

RE: "Immersion lithography tools will soon move to the test phase on fab floors, just in time to get the chip industry out of the tight spot created by the failure of 157-nanometer lithography development programs." I disagree. There is no "tight spot". There was no "failure". Immersion is a means to extend the life of a tool, the 193 nanometer scanner. Extending scanner tool life is done because it is better for the bottom line. The 248 nm scanner was extended by phase shift and OPC techniques. That left a small window for both 193 nm and 157 nm. Instead of two costly tool changes, immersion is used to extend 193 nm. The assumption is that EUV takes over next.