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To: cruzbay who wrote (148845)1/24/2005 10:42:07 AM
From: burn2learnRespond to of 275872
 
I would look at Nikon progress in Litho and base Intel's steps off this. Also note Intel has in house mask design.



To: cruzbay who wrote (148845)1/24/2005 10:43:20 AM
From: burn2learnRespond to of 275872
 
one more thing a common fix for the litho issue is resist etch back, maybe Intels is very robust. this is where all should be reading about APM from AMD..hint ...hint... APM is maybe an enabling tech for AMD / IBM, where the resist etch back process is good enough for Intel with APM as an enhancement. APM is bigger as you scale