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To: Proud_Infidel who wrote (982)2/23/2005 7:56:50 AM
From: Proud_Infidel  Read Replies (1) | Respond to of 43397
 
ASML licenses litho patent portfolio to Intel
By Peter Clarke
Silicon Strategies
02/23/2005, 5:42 AM ET

LONDON — European lithography equipment vendor ASML Holding NV (Veldhoven, the Netherlands) has licensed several lithography patents that can be used to design or produce lithography photomasks to Intel Corp., ASML said Wednesday (Feb. 23).

The agreement includes ASML's scattering bar technology, which increases the manufacturing process window and, thereby, contributes to the production of higher yields or more useable chips per wafer.

A spokeswoman for ASML said that licensing agreements were the standard way for ASML MaskTools to make its technology available to users of ASML lithography systems. A similar deal was done with Samsung Electronics Co. Ltd., in March 2003.

"ASML is proud to have the world's leading chip maker gain rights to some of our patent portfolio. As a company, ASML is committed to developing new innovations to help customers extend the capability of their lithography systems," said Eric Meurice, president and chief executive officer of ASML, in a statement.

"Twenty of the world's leading chip makers and foundries have adopted our scattering bar technology," said Dinesh Bettadapur, president and chief executive officer of ASML MaskTools, in the same statement. "The need for integrated solutions as offered by ASML to enhance the performance of lithography systems will continue to grow as customers demand ever-smaller feature sizes."

Meurice, a former Intel employee, was named as one of Silicon Strategies' 20 executives to watch in 2005.