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Technology Stocks : Applied Materials No-Politics Thread (AMAT) -- Ignore unavailable to you. Want to Upgrade?

To: Gottfried who wrote (15153)	6/1/2005 10:19:07 AM
From: Proud_Infidel	Respond to of 25522

AKT's 40K PECVD System Wins 2005 Display Equipment Award Wednesday June 1, 7:30 am ET SANTA CLARA, Calif.--(BUSINESS WIRE)--June 1, 2005--AKT, Inc., an Applied Materials company and the world's leading supplier of PECVD(1) systems to the flat panel display (FPD) industry, was honored with the Advanced Display of the Year (ADY) 2005 Award for its AKT-40K PECVD system. The award, which recognizes first-class manufacturers of FPD equipment, was given to AKT at Finetech Japan, one of the world's largest FPD exhibitions. This is the second win for AKT in the award's 10-year history. The AKT-40K PECVD system was nominated by the ADY Awards Committee, headed by Professor Shunsuke Kobayashi of Liquid Crystal Institute, Science University of Tokyo in Yamaguchi. The AKT-40K was chosen because of its superior film uniformity and significant throughput advantages for large-area TFT-LCD(2) panel manufacturing. Key to the AKT-40K system is its AKT-APXL chamber technology integrated on the proven AKT-PECVD platform. This chamber is a significant breakthrough in design that enables display manufacturers to confidently increase substrate sizes to Gen 7(3) and beyond with a cost-effective, extendible solution that delivers optimal film uniformity. The APXL chamber equalizes plasma density distribution across the entire large-area substrate, enabling less than 10% variation in film thickness over a Gen 7 substrate. Widening the process regime, the AKT-APXL chamber allows for higher deposition rate films that are not limited by gas chemistry selection. The AKT-APXL PECVD chamber is the most significant process chamber design development since AKT's 1992 introduction of the AKT-1600 PECVD chamber, the world's first capacitively-coupled, parallel-plate, high deposition rate plasma reactor in a cluster tool configuration for TFT-LCD panel manufacturing. The AKT-APXL PECVD chamber includes AKT's patented Remote Plasma Source cleaning technology, which reduces contamination to the lowest levels in the industry, and dramatically extends chamber lifetime and time between cleans. The AKT-40K PECVD systems can deposit a range of single-layer or in-situ multi-layer films of doped and undoped amorphous silicon (a-Si), silicon oxide (SiOx), silicon oxynitride (SiON) and silicon nitride (SiNx). According to Display Search, a market research firm, AKT was the market leader in PECVD systems in 2004 and is expected to further grow its leadership position in 2005. AKT, Inc., a wholly-owned subsidiary of Applied Materials, Inc. (Nasdaq:AMAT - News), is the largest supplier of PECVD products and services to the global TFT-LCD industry. AKT has led the industry in bringing technical innovation, reduced cost of ownership and continuous yield improvement with its products. Applied Materials' web site is www.appliedmaterials.com. (1) PECVD: plasma-enhanced chemical vapor deposition (2) TFT-LCD: thin film transistor liquid crystal display (3) Gen 7: substrates of approx. 1.8 meters x 2.2 meters -------------------------------------------------------------------------------- Source: AKT, Inc.