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Technology Stocks : Applied Materials No-Politics Thread (AMAT) -- Ignore unavailable to you. Want to Upgrade?

To: Cary Salsberg who wrote (16603)	11/20/2005 1:37:17 PM
From: etchmeister	Read Replies (1) \| Respond to of 25522

Bagley came to LRCX with th acquisition of the leading CMP clean tool company. Yes Ontrak supplied cleaner for short time to AMAT. However AMAT started to integrate the clean module (which obviously makes sense). I also would expect that NVLS would integrate its own clean module; CMP clean is probably using liquids in order to remove residual slurry. My guess LRCX will focus on "dry" clean similar to dry strip after etch where O2 is being used to remove (organic) resist (dry strip replaced/reduced the use of solvents for resist removal application). Photoresist stripping via dry etch is becoming more difficult because the resist could contain anorganic compounds and the oxygen ash could oxidize these residues. There are also damage related issues. A single wafer resist stripper (developed by LRCX) would compete with Gasonic and Mattson but there could be other (dry) clean applications emerging beside resist removal. This is just my 2 cents (I'm out for more than five years) If one reaches certain small dimensions liquids don't cut it; for example cleaning a contact after contact etch with greater than 6:1 aspect ratio (the contact is 6 time deeper compared to the diameter of the contact; one (very elegant) approach would be insitu right after contact etch in the same etch chamber but there could be issues with cross contamination) perhaps they are going after these applications: FSI Excalibur for sale by ClassOne Equipment. ... DESCRIPTION:, The FSI Excalibur system is a semi-automated single-wafer vapor HF etcher, capable of wafers ...