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To: sixty2nds who wrote (28235)1/25/2006 6:06:38 PM
From: etchmeister  Respond to of 95638
 
Usually I do not bank on take over but if there's a target I would think it's this one.
Unfortunately it's very hard to follow technology trends in metrology - oil is a lot easier to follow.

Opti-Probe 7341XP Tools To Be Used For 300mm Copper Based Production Processes
11/1/2005

Fremont, CA - Therma-Wave, Inc., a developer, manufacturer and sale of process control metrology systems used in the production of semiconductors, announced the Company has received a multi-million dollar, multi-tool order from a Japanese commodity device manufacturer for its Opti-Probe 7341XP thin-film and critical dimension (CD) metrology systems. Therma-Wave's Opti-Probe systems will be deployed to support front end as well as back end 300mm logic device manufacturing processes at the 90nm node as part of a transition to copper based production.

This Japan based device manufacturer selected the Opti-Probe platform including Therma-Wave's Real-Time Critical Dimension (RT/CD(R)) processing technology for the monitoring and control of advanced lithography and etch CD measurements. The order also includes Therma-Wave's Environmental Film Desorber (EFD(R)) technology to monitor gate dielectric measurements as well as the Wafer-Bow/Warp/Stress (WBWS(R)) technology for chemical vapor deposition (CVD) stress measurements.

"The Opti-ProbeXP system provides this customer with a thin-film and CD metrology solution designed specifically to address the need for increased precision in measuring ever-thinner films, and more complex materials, on smaller integrated circuit devices. Our Opti-ProbeXP addresses these challenges while facilitating high productivity throughput and a low total cost of ownership. This latest order from Japan reflects our ability to deliver advanced metrology applications to meet our customers' stringent requirements for precision and repeatability," commented Boris Lipkin, president and chief executive officer of Therma-Wave.