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To: niek who wrote (1338)	2/8/2007 2:14:54 PM
From: etchmeister	Read Replies (1) \| Respond to of 43541

Cymer noted that the number of layers is also increasing with NAND scaling aggressively, fuelling a higher number of layers requiring DUV patterning. Every ion implant requires masking/photo step - correct? Complexity = growth driver What else does one want...50% more implant steps when moving to 65nm; that's like selling a car with six tires rather than four - that should be good for tire maker To: etchmeister who wrote (26445) 10/28/2005 3:07:50 PM From: etchmeister Read Replies (1) of 26791 implant steps; at the 65-nm node Applied. engineers expect as many as 50% more high- ... PDF] PRODUCT REPORT File Format: PDF/Adobe Acrobat implantation increases the number of typical. implant steps; at the 65-nm node Applied. engineers expect as many as 50% more high- ... www.appliedmaterials.com/products/assets/front_end/FT24_product_report.pdf - Similar pages