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Technology Stocks : ASML Holding NV -- Ignore unavailable to you. Want to Upgrade?

To: niek who wrote (1352)	2/28/2007 9:49:01 AM
From: niek	Read Replies (1) \| Respond to of 43567

Wednesday, February 28, 2007 Chip tool tracing smaller patterns By Craig Wolf Poughkeepsie Journal Production of the first practical images by a leading-edge tool for creating microchip patterns has been reported by an Albany-based team in which IBM Corp. and several other companies are partners. The advance was outlined Tuesday at the International Society for Optical Engineering Advanced Lithography 2007 conference in San Jose, Calif., and reported by the College of Nanoscale Science and Engineering at the University at Albany, site of the work. The $65 million lithography tool is a massive projection machine built by ASML, a Netherlands-based company that has a $400 million research and development unit at the Albany facility. It uses extreme ultraviolet light to produce circuitry patterns on silicon wafers in the making of microchips. The smaller patterns produce more powerful processors than other methods now in production. Six months since installation, the pilot demonstration tool, the first of its kind, has been able to create "the world's first exposed images while using the tool in a development environment," Steve Janack, college spokesman, said in a news release. This production of images supports a broader effort, called the International Venture for Nanolithography, also at the Albany facility, with IBM and other companies contributing. IBM's participation in the Albany venture is closely linked to its East Fishkill chip complex. Alain Kaloyeros, college vice president, said the news "is proof positive that the UAlbany NanoCollege and New York state are providing global leadership that is not only attracting the world's leading nanoelectronics companies and the industry's cutting-edge tools, but more importantly, allowing both to succeed." Craig Wolf can be reached at cwolf@poughkeepsiejournal.com