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To: Pravin Kamdar who wrote (228866)3/25/2007 9:05:24 AM
From: combjellyRespond to of 275872
 
"It's the other way around. Random variations due to "not enough atoms" is what requires statistical modeling"

That isn't my assertion, it is Sarmad's. I haven't seen the papers in question. But, for both the reasons you assert and the implications I point out in a later post, I think he isn't ready the paper properly.

It isn't like 65nm is the first node where process variation has introduced difficulties in the model. And, quite frankly, I find the idea that the variations can't be modeled to be absurd.

But, again, I haven't read the papers in question.



To: Pravin Kamdar who wrote (228866)3/25/2007 9:59:17 AM
From: Sarmad Y. HermizRead Replies (2) | Respond to of 275872
 
That was what I said. I'll try to re-state it.

My understanding is that from one wafer to another, there are variations due to random atomic states. Because (at 65 nm and below) there are only a few atoms in each structure, the randon variation in a single atom become significant. So making adjustments (as in AMD's process control method) become less effective, and even self defeating. Because the next wafer does not reproduce the random states of the one where measurements were made.