Silicon Investor (SI) -- The First Internet Community

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Technology Stocks : ASML Holding NV -- Ignore unavailable to you. Want to Upgrade?

To: niek who wrote (1673)	4/30/2009 5:33:25 PM
From: FJB	Read Replies (1) \| Respond to of 43096

Canon posts weak lithography tool sales: further decline expected Fabtech - www.fabtech.org Lithography tool sales at Canon have declined further, due to lack of demand specifically from the memory manufacturing sector, the company said. Canon sold only four lithography tools in the first quarter of 2009, none were leading-edge 193nm ArF systems. Canon expects sales of lithography tools in 2009 to be below its previous guidance due to semiconductor companies revised capital spending plans. Canon said it had sold 99 lithography systems in 2008, but expected only 16 unit sales in its FY2009. The revised forecast includes sales of only 2 ArF systems, 2 KrF systems and 6 i-line systems in FY2009, bring the total down to 10. fabtech.org

To: niek who wrote (1673)	5/16/2009 6:58:40 AM
From: niek	Respond to of 43096

Nikon said to be delaying EUV lithography development John Walko EE Times Europe 05/15/2009 LONDON — Lithography specialist Nikon is understood to have put on hold development of some of its EUV tools, which could give ASML a huge early advantage in commercial deployments of the emerging chip making technology. According to Richard Windsor, industry specialist at securities house Nomura (London) this is somewhat surprising as this technology was loudly touted earlier this year. "Nikon at that time also discussed a 2012 shipment date but clearly that is now uncertain." Windsor notes that by contrast ASML's EUV program looks "very much on track" and the Veldhoven, Holland-based company "aims to ship beta tools to customers in the second half of 2010." He suggests that if the Japanese tools developer does not restart investments in EUV soon, "ASML's virtual monopoly may well become a real one. We estimate this lead to be at 18 months but clearly that will now meaningfully increase." "We are surprised by Nikon's decision and I can only conclude that agonies being endured in Japan are greater than those being suffered in Veldhoven," adds Windsor. The development will not please Intel, which still dual sources lithography equipment and has been testing Nikon EUV prototypes, the Nomura industry specialist emphasizes. "Consequently, I suspect that Nikon's program will restart sooner rather than later with some pressure / help from Intel. Whatever happens ASML is a net winner from this." The analysis comes despite "the substantial progress that Nikon showed at this year's SPIE Advanced Lithography event in March." As EE Times reported at the time, there was something of a triple-whammy for lithographers at the SPIE conference, as the industry continues to be plagued by an R&D gap, technology delays, and, of course, the lousy economy. Experts at the event warned about an alarming R&D funding shortfall for the various next-generation lithography (NGL) technologies--extreme ultraviolet (EUV), maskless and nano-imprint--creating more fear, uncertainty and doubt about the insertion of these schemes for mass IC production. There was a feeling that some technologies like EUV remain delayed or on the ropes, leaving leading-edge chip makers to resort to an assortment of complex, costly and unpopular double-patterning schemes.