Orignal press release has the unit numbers for different systems.
asml.com
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VELDHOVEN, the Netherlands, Jan 19, 2011 - ASML Holding NV (ASML) today announces 2010 fourth quarter and full year results according to US GAAP as follows:
Q4 2010 net sales of EUR 1,521 million versus Q3 2010 net sales of EUR 1,176 million (Q4 2009 net sales of EUR 581 million). Full year 2010 net sales were EUR 4,508 million, up 182.4 percent versus 2009 net sales of EUR 1,596 million.
Q4 2010 net income of EUR 407 million, or 26.7 percent of net sales, versus a Q3 2010 net income of EUR 269 million, or 22.8 percent of net sales (Q4 2009 net income of EUR 50 million or 8.7 percent of net sales). Full year 2010 net income amounted to EUR 1,022 million or 22.7 percent of net sales, compared with 2009 net loss of EUR 151 million or 9.5 percent of net sales.
Q4 2010 net bookings of EUR 2,315 million (see page 3), with 117 systems including 104 new and 13 used systems, leading to a systems backlog valued at EUR 3,856 million as of December 31, 2010.
"The fourth quarter was a strong close to a remarkable year in the history of ASML during which we achieved record sales, profit and bookings," said Eric Meurice, President and Chief Executive Officer of ASML. "In order to meet brisk demand for our advanced technology products as well as for our capacity tools, we almost tripled the output of our factory in 2010 compared with 2009, through expansion of our fixed and flexible workforce, and by structural cycle time improvements. In the quarter, we shipped 13 TWINSCAN XT:1950 systems, our immersion workhorse, in addition to 14 of our most advanced volume production immersion system TWINSCAN NXT:1950 which has now become the industry's premier immersion platform capable of overlay of less than 3 nanometers (nm) in high volume production. While we have taken immersion imaging performance to the next level, we have also enhanced productivity to new record, as four immersion systems succeeded to process more than one million wafers each over 2010. During the fourth quarter, we also shipped the first of our second generation EUV systems, the NXE:3100 and successfully exposed wafers at a customer manufacturing site. In coming months, five more customers will receive their NXE:3100 systems, as EUV is now confirmed the most likely lithography platform to continue Moore's Law towards smaller, cheaper and more energy-efficient semiconductors," Meurice added.
Outlook
"We booked more than EUR 2 billion worth of orders in the fourth quarter of 2010, leading to a record year-end backlog of EUR 3.9 billion of systems shippable in 2011. This record-breaking backlog and the additional expected Q1 bookings 2011 confirm a potential for more than EUR 5 billion of net sales in 2011," Eric Meurice said. "The overall macro-economic drivers are still mixed since the end of the summer, but the semiconductor market is sustained by a very rich leading edge technology mix, which in turn justifies the large backlog for our products. Indeed, NAND Flash memory, DRAM memory, micro-processors and overall Logic manufacturers are all ramping their new nodes at the same time, in parallel to some strategic or catch-up investments in lithography, thus ensuring a very positive short term to mid term investment level. Beyond 2011, we foresee further technology transitions through the insertion of EUV, based on our third generation platform, the NXE:3300 for which we have received nine orders to date; it is certainly too early to commit numbers for 2012, as the industry still needs a number of months to confirm EUV plans, performance and roadmaps, but it is encouraging to envision this other engine of growth for 2012 and beyond," Meurice said.
ASML expects Q1 2011 net sales of around EUR 1.4 billion. ASML expects a gross margin in Q1 2011 of between 44 and 45 percent. R&D costs are expected to be at EUR 145 million and SG&A costs are expected at EUR 55 million. |
