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To: Bookdon who wrote (10053)	11/18/1997 8:55:00 PM
From: megazoo	Read Replies (1) \| Respond to of 25960

lots of news coming out of asia re:reuters. some good, some bad. quote.yahoo.com

To: Bookdon who wrote (10053)	11/18/1997 9:27:00 PM
From: James Word	Read Replies (1) \| Respond to of 25960

Brookdon: "I asked for a quotation from IBM for a phase shift mask (NOT as difficult as an x-ray mask" What type of PSM? Attenuated (soft PSM - not to hard to make) or Alternating (hard PSM - very tough to make)? $40K seems like a reasonable price though. The major issue with X-ray masks as I see it is the fact that features are at 1X on the reticle, rather than 4X on DUV scanners. So linewidth accuracy for X-Ray reticles must be much higher. I think that X-ray masks will be more cost competitive once OPC and Hard-PSMs for DUV lithography become "commonplace". Eventually optical litho will get to the point where its like squeezing water from a turnip. Extreme low "k" imaging will probably cost as much as X-ray or some of the other newfangled technologies. I'm not to surprised that IBM announced that they will be using some X-ray steppers to make DRAMS. They did the same thing about 10 years ago, didn't they? It never quite panned out the way they thought. Most agreed that they were ahead of their time. "Pioneering" and that sort of thing. James Word