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To: ZhuGe KongMing who wrote (10136)	11/20/1997 4:38:00 PM
From: Mr. Aloha	Respond to of 25960

AMAT reported strong results! ''The improved industry environment was driven primarily by strength in the logic and microprocessor markets, increased Asian foundry investment and technology buys for 0.25 micron level production,'' continued Morgan. ''This is evidenced by our fourth fiscal quarter new orders, of which almost 40 percent were for 0.25 micron or below applications. Our strong product capability in leading-edge technology enabled us to gain significant market share in etch, physical vapor deposition (PVD), chemical vapor deposition (CVD), chemical mechanical polishing (CMP) and rapid thermal processing (RTP). Two of our advanced technology products won Semiconductor International's ''Editor's Choice Best Product'' awards: the Ultima HDP (High Density Plasma)-CVD Centura and the Metal Etch DPS (Decoupled Plasma Source) Centura systems. This is great news for the industry! Aloha

To: ZhuGe KongMing who wrote (10136)	11/20/1997 5:21:00 PM
From: Tulvio Durand	Read Replies (1) \| Respond to of 25960

Really 0.49 earned by AMAT excluding 2 cent charge. Significant excerpt from release, www1.newsalert.com <<The improved industry environment was driven primarily by strength in the logic and microprocessor markets, increased Asian foundry investment and technology buys for 0.25 micron level production," continued Morgan. "This is evidenced by our fourth fiscal quarter new orders, of which almost 40 percent were for 0.25 micron or below applications.>> Tulvio