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Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?


To: ben luong who wrote (10601)11/26/1997 5:59:00 PM
From: Gary Hoyer  Respond to of 25960
 
Statements on Cymer's next generation (beyond DUV) research:

First, remember that excimer lasers and DUV IS THE NEXT GENERATION in wafer lithography. It is just starting and will last for years. We shouldn't loose site of this in spite of the occasional pop-ins by the JMAR advocates.

Now, to everyone worrying about x-rays and whatever will be the next next generation (5 to 10 years out), rest assured that Cymer is not sitting on its ass. Here is a quote from Akins from the September CC Q&A session (thanks again to Scott for transcribing it):

Simon English

This is his colleague Josephine from (mumble) International Bank. Could you comment on an article that was published last Thursday on the front page of the Financial Times, which said that a group of U.S. companies had joined in a project to develop extreme ultraviolet equipment. It was Intel, AMD, and Motorola linking up with three U.S. Dept. of Energy and equipment makers Nikon and ASML. Are you involved in this project?

Answer

Thank you. I would love to comment on that. We are very excited about that program and other programs that are exploring EUV. We feel that EUV is, at this point in time, the most viable technology to follow excimer laser DUV lithography. The program you mentioned is one that's exploring the production of EUV radiation or soft X-rays. Using a complex multiple laser system that is sometimes described in these articles as a kilowatt or multi-kilowatt solid state pumped laser kind of a generation technique. Although we are excited by EUV, we are not excited about that concept. We feel that it does not have the scalability to be a manufacturing-robust tool. We have our own design concepts for how to approach the production of DUV, and we are in the design conceptualization stage, that does not use any lasers whatsoever, but instead uses a direct electricity to a soft X-ray conversion technique. Which we think is going to have the potential to be very very competitive for a production-worthy light source. So again, we are happy to see other companies starting to embrace the concept of EUV, and we think our design approach will be more than competitive against those pursuing these very complex laser based systems.


Hope this helps Ben,
Gary.