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To: Jess Beltz who wrote (10606)	11/26/1997 6:55:00 PM
From: Bookdon	Respond to of 25960

That is correct. Etec makes two lines of equipment (both of which are used to make masks). One uses an electron beam to expose substrates (masks), and the other uses lasers to expose the mask blanks (not yet using 248 nm lasers, but maybe in the future). Our biggest sales, however, are for people who are switching from 0.5 and 0.35 micron processes to 0.25 and below (the reticles, or masks, are reduced by 4x or 5x when projected on the wafers, so features can be 4 to 5 times LARGER than those on the wafer; we don't need the shorter wavelenghths yet for our laser tools).