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To: S. Wallace Slough who wrote (10646)	11/27/1997 3:44:00 PM
From: Yakov Lurye	Read Replies (1) \| Respond to of 25960

S., I am a wrong person to address your question to, but Hitachi system as of NOW seems to be less productive than the alternatives commercially available: "Throughput is about 10 8-inch wafers per hour when the e-beam system writes all of the layers... that compares with 30 wafers /hour for krypton fluorine (KrF) excimer-laser steppers." This is 1:3 productivity ratio, would be interesting to know how long did it take Hitachi to triple the productivity in comparison with the previous system: "Hitachi's new e-beam system triples the write speed over that of its predecessor by speeding up the control circuitry and improving the beam deflection, said Ryozo Akabane, a senior equipment engineering manager." Also note that "in actual use e-beam systems will be in mix-and-match configurations with KrF lithography." Thanks for an interesting article Y.