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Technology Stocks : JMAR Technologies(JMAR) -- Ignore unavailable to you. Want to Upgrade?

To: CL Lewis who wrote (4273)	12/2/1997 12:11:00 AM
From: Starlight	Read Replies (1) \| Respond to of 9695

Tim & CL - You're right -- I'd forgotten about the collimator being used to increase the power level. I was only thinking about focusing the beam -- which they don't need to do to make it "work". However, I believe I was told the collimator WOULD be used to increase the power level for FUTURE system designs of point source. I don't think they plan to use it on the first system they are producing. Betty

To: CL Lewis who wrote (4273)	12/2/1997 1:09:00 AM
From: timwa	Respond to of 9695

Here are some links related to collimators and x-ray lithography. members.aol.com (nice picture) laurin.com techjunction.com Here is a summary of JMAR's contract Demonstration of Laser Plasma X-Ray Source with Resonant Reflector Collimator JMAR Technology Co. (JTC) is developing a laser-produced plasma x-ray point source, generating x-rays in a wavelength range around 11A. This source may be used in future lithography systems to manufacture semiconductors having 0.13 micron features. The efficiency of the source, and hence the throughput of semiconductor wafers, could be significantly enhanced by use of an x-ray collimater to effectively transform the spherical x-ray radiation pattern of the point source toa linear beam. Lawrence Livermore National Laboratory (LLNL) is developing x-ray collimators for point sources in this wavelength range, based on a conical reflecting surface, coated with multilayer x-ray mirror to achieve reflectivity. In Phase I, this STTR proposes to couple a prototype LLNL collomator to the JTC source, and carry out a series of measurements to characterize the system performance relative to the requirements for 0.13 micron lithography. This data will include beam divergence and collimator gain, and will be used in a preliminary design of a scanned-beam system which meets the exposure uniformity requirements for lithography. In Phase II, the scanned-beam system will be constructed and used to demonstrate lithographic transfer of features