Silicon Investor (SI) -- The First Internet Community

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?

To: Yakov Lurye who wrote (11291)	12/9/1997 8:37:00 PM
From: Mr. Aloha	Respond to of 25960

Thanks for the links. Interesting! Sounds like business is ready to roll. Aloha

To: Yakov Lurye who wrote (11291)	12/10/1997 12:16:00 PM
From: Tulvio Durand	Read Replies (2) \| Respond to of 25960

Yakov, the Nikon link mentions joint use of i-line and DUV steppers in "mix and match". Does the "mix and match" mean that the new generation ICs are printed with combination of 0.25 nm and 0.35 nm features in different layers of the IC? If not, can someone explain "mix and match"? Thanks. Here's excerpt from the referenced Nikon link: <<NSR-2205EX14C, which employs KrF excimer laser (wavelength 248 nm) for the 22 x 22 mm exposure field, has achieved sub-quarter micron resolution. NSR-2205EX14C has also improved the throughput by 35% compared to its predecessor NSR-2205EX12B. NSR-2205i14E using i(I)-line (wavelength 365 nm) for its light source is concurrently offered to take an utmost advantage of the two types of machines by "mix-and-matching".>>