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To: Cary Salsberg who wrote (3729)	12/11/1997 6:40:00 PM
From: 16yearcycle	Respond to of 10921

Cary, I posted this on the amat thread. Was it here already? If so, my apologies. ___________________________________________________________________ KLA-Tencor Announces Record Multiple Thin FilmMeasurement Tool Order from White Oak Semiconductor December 11, 1997 05:01 PM SAN JOSE, Calif.--(BUSINESS WIRE)--Dec. 11, 1997--KLA-Tencor Corp. KLAC , today announced that it has been chosen by White Oak Semiconductor to be its sole thin film measurement tool provider, following a competitive evaluation. A total of 19 systems were ordered, the largest single thin film measurement tool order for KLA-Tencor to date. The initial systems have been installed, and tool qualification is currently underway. The systems were chosen primarily for their ability to accommodate White Oak's requirement for film measurement across the fab, including chemical mechanical planarization (CMP), photolithography, etch, chemical vapor deposition (CVD), implant, diffusion and metals. The order includes a combination of UV-1280SE and UV-1080 systems. White Oak Semiconductor, located in Richmond, Va., a joint venture of Siemens Semiconductor Group and Motorola Semiconductor Products Sector, will use the KLA-Tencor thin film measurement tools, as well as a variety of other KLA-Tencor systems, in the production of 64 megabit dynamic random access memories (DRAMs) using 0.25 micron technology, on 8-inch wafers. "We were pleased to be selected as the single supplier for film measurement tools in such a competitive environment," observed Gary Bultman, general manager of KLA-Tencor's Film Measurement Division. (Male)"KLA-Tencor's superior technical performance, lowest cost of ownership and strong field support capabilities were significant factors in the decision making process. In addition we hold a proven performance record with over 200 spectroscopic ellipsometer (SE) systems installed in leading fabs around the world." KLA-Tencor's UV-1280SE combines SE and broadband ultraviolet (UV) spectrophotometry into a single-solution, production-proven system for measuring multiple film variables and multiple film layers simultaneously, without referencing. This capability gives advanced manufacturing confidence in the data used to control critical films. Designed for both process control and advanced materials research, the UV-1280SE reduces manufacturing costs and speeds time-to-market. UV-SE technology is used throughout the fab to measure thin films, refractive index, extinction coefficient, degree of crystallinity, void fractions in films and multi-layer film stacks. This technology is capable of measuring multiple parameters (six to eight, typically), making it possible to accurately measure ultra-thin film stacks including gate oxides, low pressure CVD (LPCVD) nitride and thin oxide/nitride/oxide on polysilicon on oxide (ONOPO), as well as new materials such as silicon rich oxides, silicon carbide, SiGe and SiON ARL. The UV-1080 dual-beam spectrophotometer is primarily used to measure thicker films of up to tens of microns for pre- and post-etch, CMP and plasma-enhanced CVD (PECVD) applications. In addition, it is used to directly measure UV reflectivity for photolithography and metals process control. About KLA-Tencor: KLA-Tencor is the world leader in yield management and process control solutions for semiconductor manufacturing and related industries. An S&P 500 company, KLA-Tencor is traded on the NASDAQ National Market under the symbol KLAC. Additional information about the company is available on the Internet at www.kla-tencor.com . Gene