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To: Yakov Lurye who wrote (11401)12/11/1997 8:09:00 PM
From: James Word  Read Replies (2) | Respond to of 25960
 
RE: DUV/i-line mix and match throughput

As long as both the i-line and DUV stepper operate at 80WPH, the overal throughput is 80WPH whether you go all DUV or use both.
If a product must go through the lithogrpahy process 20 times during
the course of fabrication, what difference does it make if
5 of those time are through DUV and 15 are i-line, or if all are
DUV? Throughput is the same.
Of course, DUV steps cost 2X more than i-line steps so the desire
is to limit those to the bare minimum.

James Word



To: Yakov Lurye who wrote (11401)12/11/1997 11:29:00 PM
From: Tulvio Durand  Read Replies (1) | Respond to of 25960
 
We are in agreement, Yacov. And the question you pose -- ... whether the reduction in the line width could help to reduce the number of runs needed to finish the chip? -- is indeed the central question. I have to believe that the answer has to be affirmative, otherwise why bother with 0.25 nm. But the logic is not clear insofar as with mix-and-match. Regards, Tulvio


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