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Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?


To: Maxwell who wrote (11564)12/15/1997 4:47:00 PM
From: Czechsinthemail  Read Replies (4) | Respond to of 25960
 
Maxwell,
Thanks for the informative post on critical layers. One question that keeps coming up for me, particularly around DRAM, is the economics of 0.25 micron tools. Since we seem to be in an environment of weak DRAM prices, is there enough margin in the increased yield of 0.25 micron to support major investments in new equipment at this point? Much of the discussion swirling around the Korean companies seems to hinge around whether they can't afford the 0.25 equipment or whether they can't afford not to afford it.
I'd appreciate any information you or others could contribute regarding the economies of 0.25 production, since I think that it is important in trying to get a sense of what marginal decisions to purchase or defer purchase semi companies are likely to make.
Thanks,
Baird



To: Maxwell who wrote (11564)12/15/1997 8:35:00 PM
From: James Word  Respond to of 25960
 
Maxwell, Tulvio RE: Critical/Non-critical

The definition of what constitutes a critical layer is dependent on the device being manufactured. The devices that my company works on
have about 8 critical layers and maybe 10 to 12 non-critical. Overlay
requirements in addition to linewidth determine the cut-off point.

My company, as well as many others, buy tools specifically for handling non-critical layers, those with >0.8um CDs and >0.2um overlay
tolerance. Most stepper manufacturers make a tool that is specifically designed for non-crits. Usually these tools can print
2 to 4 stepper fields in 1 shot, thus dramatically increasing throughput.

BTW, I was the one who predicted decades of life for DUV. Here's why.
Right now the definition for critical layer may be anything >0.8um
linewidth. That is ~ 3X larger than current leading edge critical
dimensions (CDs). What happens when leading edge CDs are <0.1um?
Obviously 248nm DUV will not print those dimensions. But it will
probably still be capable of printing the non-critical dimensions which will probably be anything >0.3um linewidths.

Right now, Ultratech stepper is the leader in non-critical tools.
Their leading edge tool is an i-line 2:1 stepper I believe. Who
knows, maybe in 5-10 years their leading edge tool will have to be
a 248nm DUV stepper or scanner, something that we consider state of
the art by todays standards

"The reason that the industry still using mix-match stuff is that they have to utilize the tools they already paid for. It only make sense."

We do this too, utilizing our old g-line systems for extremely non-critical. They have a resolution of ~0.6um but the overlay is no better than 0.3um. Not too good. When we build a new fab, we will
no longer buy g-line, but will buy some non-crit i-line tools.

"In short term buying i-line along with .25um steppers is the best model. In longer term like 2-3 years down the road, buying all .25um excimer steppers is the best choice since these tools will be alive and well in the future. "

It depends. Critical level i-line tools are ~$4mil. Non-critical
i-line tools can be had for <$3mil. The cost advantage is even greater than 3:4 since the productivity of the non-critical tools is much greater than the critical tools.

Remember, new fabs are being built all the time. They are going to
be filled with NEW equipment, and many companies utilize the mix and
match approach. This may be bad for Cymer short term since nobody is
going to build an ALL DUV fab. But long term it is a good thing for them since DUV will probably still be used during the "X-Ray" (or whatever) generation in a mix and match capacity to reduce cost.

James Word



To: Maxwell who wrote (11564)12/15/1997 10:31:00 PM
From: Tulvio Durand  Read Replies (1) | Respond to of 25960
 
A ratio of 3:1 i-line/DUV steppers in new orders was announced by ASM recently. Since chip manufacturers already have i-line steppers why do they need to buy more of them now, when the trend is towards 0.25 nm? Do these new i-line steppers have capability to do higher resolution features? For example, can they be retrofitted later with DUV excimer lasers? Thanks, Maxwell, for your in-depth explanation. Tulvio