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Technology Stocks : Cymer (CYMI) -- Ignore unavailable to you. Want to Upgrade?


To: Cymeed who wrote (11963)12/26/1997 8:41:00 AM
From: dylan murphy  Respond to of 25960
 
one guy's view on the stock.

smartmoney.com



To: Cymeed who wrote (11963)12/26/1997 8:42:00 AM
From: Volsi Mimir  Read Replies (1) | Respond to of 25960
 
Short Interest Inquiry?-Anyone have WSJ or IBD this AM to look up CYMI short interest-should be out in the media this AM-out here in the hinterland I won't get them til 3-4PM Pacific.

eddyb



To: Cymeed who wrote (11963)12/26/1997 10:42:00 AM
From: Yakov Lurye  Read Replies (2) | Respond to of 25960
 
Re: <futuristic technologies>

Cymeed, worrying about technologies that most likely will not be feasible for at least 5 years seems a bit premature. It is a virtual certainty that DUV systems will be deployed in increasing numbers for the next few years.

Anybody committed to holding CYMI stock must assess for him(her)self the competitive threat to future CYMER's market share presented by Lambda and Komatsu. I am prepared to suffer through the temporary problems caused by SEA currency crisis, DRAM glut etc and to defy the general stock market downtrend - but it all makes sense only if CYMI fundamentals will remain intact.

Meanwhile, I'd gambled on some Jan15 calls. They seem to be a bit overpriced, though - or is it my broker?

Regards,

Y.



To: Cymeed who wrote (11963)12/26/1997 11:24:00 AM
From: Gary Hoyer  Read Replies (2) | Respond to of 25960
 
** Regarding the reported Japanese Ion-beam doping breakthrough: **

After reading the Mercury News article I can tell all Cymer investors not to worry. The reported breakthrough is in the area of silicon doping using ion-beam implanters and has nothing to do with the lithography step. A long time ago I used to operate an ion-beam implanter at an old Burroughs fab. Ion-beam implanters are used to dope silicon with impurities to make it either a conductor or an insulator.

The breakthrough allows doping at a much finer line-width, which is good news. However, the breakthrough has nothing to do with creating the super-fine (.05 micron) patterns or masks on the wafer! This line-width is in the realm of X-ray or EUV, something that is still experimental.

So the bottom line is that this Japanese advance is just one of several MAJOR advances that needs to take place in order to actually build sub .1 micron chips. IMO, the bottleneck is still going to be the lithography step as the technology beyond DUV is not yet clear.

Hope this sheds some light,
Gary.